High-rate reactive magnetron sputter deposition and characterization of metal oxide films /

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Bibliographic Details
OCLC:47068374
Main Author: Olsson, Maryam Kharrazi
Corporate Author: Uppsala universitet
Language:English
Published: Uppsala : Acta Universitatis Upsaliensis, 2000.
Series:Acta Universitatis Upsaliensis. Comprehensive summaries of Uppsala dissertations from the Faculty of Science and Technology ; 520.
Subjects:
Thin films.
Sputtering (Physics)
Metallic oxides > Surfaces.
Magnetrons.
Format:

Thesis Monograph

Note that CRL will digitize material from the collection when copyright allows.

Description
Physical Description:78 p. : ill. ; 25 cm.
Bibliography:Includes bibliographical references (p. 72-78)
ISBN:9155446833
9789155446833
Place of Publication:Sweden.

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